The Growth of Porous TiO2 Film Using RF Magnetron Sputtering Technique and the Application for Photoelectrochemical Device

  • SoonHyung Kang, Seoul National University, Korea
  • Mr Jae-Yup Kim, Seoul National University, Korea
  • Mr Hyun-Sik Kim, Seoul National University, Korea
  • Professor Yung-Eun Sung, Seoul National University, Korea
  • Titanium dioxide, TiO2, have been widely studied because of attractive advantages, such as nontoxic, cheap, and various applications which are photoelectrochemical solar cells, photocatalyst, and photoelectrochemical splitting of water.1 Especially, the nanoporous TiO2 film was pursued to improve the solar to electricity power conversion efficiency because of its high surface area. For the increase of the specific surface area and film porosity, we try to grow the columnar structured TiO2 film by changing the substrate temperature (Tsub) during 2h. As the Tsub is increased, the specific surface area and porosity of TiO2 thin film are also increased, confirmed by the measurement of refractive index. Meanwhile, the high Tsub (> 350°C) provides the driving force to predominantly form the TiO2 rutile phase, following the abruptly degraded conversion efficiency. Furthermore, as the Tsub is increased, the light absorption of TiO2 film is extended to visible light wavelength, resulted from the formation of rutile phase and various defect states grown in the pure Ar ambient. Above results were characterized by X-ray diffraction (XRD) and X-ray photoelectron spectroscopy (XPS) etc. Furthermore, grown TiO2 film at T350°C showed the high efficiency (1.68%), even though the slightly thin film (~ 800 nm). Then, at this condition, as the thickness of TiO2 film is increased by the increase of sputtering time, the maximum efficiency was achieved at approximately 2.74% with the 2.2μm thickness. Figure 1 shows grown TiO2 morphology by sputtering method, depending on the Tsub and growth time. Added results and discussion will be presented.