Monolithic DSSCs have been investigated with regard to the role of the scattering layer. Monolithic DSSCs have the same operating procedure as a standard DSSC, but with an alternative architecture. This structure involves replacing the platinum coated FTO-glass counter-electrode with a graphite/carbon-black layer on top of the TiO₂ layer and the scattering layer, thus removing the need for the FTO-glass in the counter-electrode. This is advantageous as conducting glass is known to contribute to a considerable portion of the cost DSSCs. The monolithic design may also have advantages in that it allows for simplified manufacture and better sealing of cells, especially with solid state devices.

A scattering layer is employed because of its ability to improve light harvesting and to separate the working and counter-electrodes. However the role and structure of this layer has not yet been fully understood in the monolithic DSSC.

Scattering layers considered here are made from 400nm TiO₂ and/or 300nm ZrO₂, with comparison to cells without scattering layers to investigate the function of this layer and its optimal composition. In previous work this layer has been made of ZrO₂, which is photovoltaicly inactive and an insulating layer between the TiO₂ and graphite layers, to prevent transfer of TiO₂ conduction band electrons to the graphite. This assumption is investigated and challenged as TiO₂ and graphite make a blocking contact. This means the scattering layer can be made of large particles of photovoltaicly active anatase TiO₂ allowing for an increased light harvesting ability of the cell.